Cooperation in the framework of high-technology electron-beam lithography project
MIET and Vistec Electron Beam GmbH (Germany) started cooperation in the framework of high-technology electron-beam lithography project.
After installation and start-up work MIET-based Centre of Mask Design and Manufacture can provide Russian semiconductor industry as well as scientific-research institute with high-technology masks for different applications.
Wolfgang Dorl, general Director of Vistec Electron Beam GmbH, claimed to be very proud of the possibility to cooperate with MIET. He sees the electron-beam unit as the continuing development of the company’s long-standing business relations with Russia. He also expressed the wish that the project helped Vistec Electron Beam GmbH in opening new interesting possibilities at the fast emerging market of Russia.
Учредитель: Префектура ЗелАО г. Москвы



