Cooperation in the framework of high-technology electron-beam lithography project
MIET and Vistec Electron Beam GmbH (Germany) started cooperation in the framework of high-technology electron-beam lithography project.
After installation and start-up work MIET-based Centre of Mask Design and Manufacture can provide Russian semiconductor industry as well as scientific-research institute with high-technology masks for different applications.
Wolfgang Dorl, general Director of Vistec Electron Beam GmbH, claimed to be very proud of the possibility to cooperate with MIET. He sees the electron-beam unit as the continuing development of the company’s long-standing business relations with Russia. He also expressed the wish that the project helped Vistec Electron Beam GmbH in opening new interesting possibilities at the fast emerging market of Russia.